Hideto Tateno

Introduction

Hideto Tateno is a prominent inventor based in Toyama, Japan, known for his significant contributions to the field of substrate processing technology. With a remarkable portfolio of 20 patents, Tateno has played a key role in advancing the capabilities of processing apparatuses used in various industrial applications.

Latest Patents

Tateno's latest innovations include groundbreaking patents such as the "Furnace for Substrate Processing Apparatus" and "Substrate Processing Apparatus". These inventions include essential components for efficiently accommodating substrates within a process chamber. Key features of these patents involve a vaporizer designed to vaporize a liquid precursor, generating a reaction gas and delivering it through a processing gas that contains both the reaction gas and a carrier gas. Notable components include a vaporization vessel, a heater for liquid precursor heating, and flow rate controllers for both carrier gas and liquid precursor, as well as a gas concentration sensor.

Career Highlights

Hideto Tateno has honed his expertise while working for reputable companies, including Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His time in these organizations has been marked by significant achievements and contributions to innovative projects in substrate processing.

Collaborations

Throughout his career, Tateno has collaborated with talented professionals such as Daisuke Hara and Masahisa Okuno. These partnerships have fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies in their field.

Conclusion

Hideto Tateno exemplifies the spirit of innovation through his extensive work on substrate processing technologies. His patents not only highlight his technical proficiency but also his commitment to advancing industry standards. As he continues to innovate, Tateno's contributions will undoubtedly influence future developments in substrate processing apparatuses.