Yokohama, Japan

Hidenori Sato

USPTO Granted Patents = 10 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2014)
  • Kanagawa, JP (2015 - 2016)
  • Yokohama, JP (2016 - 2017)

Company Filing History:


Years Active: 2014-2017

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10 patents (USPTO):Explore Patents

Title: Hidenori Sato: Innovator in Mask Manufacturing Technology

Introduction

Hidenori Sato is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of mask manufacturing technology, holding a total of 10 patents. His innovative work has advanced the methods and equipment used in the production of masks, particularly in the semiconductor industry.

Latest Patents

Among his latest patents is a sophisticated mask manufacturing equipment and method. This equipment includes a detector that identifies positional deviations of patterns formed on a mask substrate. The irradiator then uses laser light to create a heterogeneous layer that expands in volume within the mask substrate. The calculator determines the optimal irradiation conditions based on the detected deviations, allowing for precise adjustments to the pattern area. Additionally, he has developed a positional deviation measuring device and a method for manufacturing semiconductor devices, which involves adjusting the refracting angle of incident light and calculating positional deviations based on reflected light patterns.

Career Highlights

Hidenori Sato has worked with notable companies such as Toshiba Corporation and Nuflare Technology, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.

Collaborations

Throughout his career, Sato has collaborated with esteemed colleagues, including Nobuhiro Komine and Kentaro Okuda. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Hidenori Sato's contributions to mask manufacturing technology exemplify his dedication to innovation and excellence. His patents and collaborations have significantly impacted the semiconductor industry, showcasing his role as a leading inventor in this field.

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