The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Sep. 11, 2014
Applicant:
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Inventors:
Hidenori Sato, Yokohama, JP;
Manabu Takakuwa, Tsu, JP;
Nobuhiro Komine, Nagoya, JP;
Taketo Kuriyama, Yokkaichi, JP;
Assignee:
Kabushiki Kaisha Yoshiba, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/62 (2006.01); G03B 27/32 (2006.01); G03F 1/72 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01); G03F 7/70283 (2013.01); G03F 7/70425 (2013.01); G03F 7/70783 (2013.01);
Abstract
According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.