This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Memory Corporation. Active years: 2014-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Mie, JP (2014)
- Kuwana, JP (2017)
- Yokkaichi, JP (2017)
Company Filing History:
Years Active: 2014-2017
Title: Taketo Kuriyama: Innovator in Mark Pattern Technology
Introduction
Taketo Kuriyama is a notable inventor based in Kuwana, Japan. He has made significant contributions to the field of mark pattern technology, holding a total of 3 patents. His innovative work has implications in various industries, particularly in the processing of substrates.
Latest Patents
Kuriyama's latest patents include a method of forming a mark pattern, a recording medium, and a method of generating mark data. In his method of forming a mark pattern, a film to be processed on a substrate is coated with a photosensitive film. The photosensitive film is then irradiated with exposure light via a mask. This mask contains a first circuit pattern with a first transmittance and a mark with a second transmittance, which is used to measure superposition between films. By irradiating with exposure light, a second circuit pattern and a mark pattern are formed on the substrate, each having different film thicknesses.
Another significant patent involves a mask processing apparatus and method. This apparatus includes a stage, a laser light source, and a rotary mechanism. The stage holds a mask formed with a pattern to be transferred to a substrate. The laser light source outputs laser light that alters the mask, while the rotary mechanism rotates the stage in the in-plane direction of the mask's pattern formation surface.
Career Highlights
Throughout his career, Taketo Kuriyama has worked with prominent companies such as Toshiba Corporation and Toshiba Memory Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies.
Collaborations
Kuriyama has collaborated with notable colleagues, including Nobuhiro Komine and Manabu Takakuwa. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Taketo Kuriyama's contributions to mark pattern technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of substrate processing and have the potential to influence various applications in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile