Annaka, Japan

Hidenori Koshikawa


 

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Gunma-ken, JP (2008)
  • Annaka, JP (2012 - 2024)

Company Filing History:


Years Active: 2008-2024

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9 patents (USPTO):Explore Patents

Title: Hidenori Koshikawa: Innovator in Fluoropolyether-Based Compositions

Introduction

Hidenori Koshikawa is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of fluoropolyether-based compositions. With a total of 9 patents to his name, Koshikawa continues to push the boundaries of innovation in his field.

Latest Patents

Koshikawa's latest patents include a curable fluoropolyether-based rubber composition and an optical component. The rubber composition is designed to produce a cured product that exhibits excellent light transmissivity and rubber strength. Additionally, the optical component features a cured product layer made from this innovative composition. Another notable patent involves a heat-curable fluoropolyether-based adhesive composition. This adhesive can bond to various base materials, including metal, ceramic, and plastic, in a short period of time. The composition utilizes an adhesion imparting agent that contains an alicyclic epoxy group and fluorine, enhancing its effectiveness in electric and electronic components.

Career Highlights

Koshikawa is currently employed at Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work focuses on developing advanced materials that meet the demands of modern technology. His innovative approaches have garnered attention and respect within the scientific community.

Collaborations

Koshikawa has collaborated with notable coworkers, including Mikio Shiono and Hiroyasu Hara. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Hidenori Koshikawa is a distinguished inventor whose work in fluoropolyether-based compositions has made a significant impact in the field of materials science. His innovative patents and collaborations highlight his commitment to advancing technology.

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