Location History:
- Yokohama, JP (1996)
- Mie, JP (2008)
- Mie-ken, JP (2011)
Company Filing History:
Years Active: 1996-2011
Title: The Innovative Contributions of Hidemi Kanetaka
Introduction
Hidemi Kanetaka is a prominent inventor based in Mie-ken, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work focuses on advanced methods for surface treatment and semiconductor device manufacturing.
Latest Patents
Kanetaka's latest patents include a surface treatment method, an etching method, and a method for manufacturing electronic devices. The surface treatment method involves removing a fluorocarbon-containing reaction product from the surface of a workpiece using oxygen gas plasma processing. This workpiece consists of multiple layers, and the method also includes the removal of an oxide-containing reaction product using hydrogen fluoride gas after the fluorocarbon product has been eliminated. Additionally, her patent on semiconductor devices outlines a process that includes forming a gate-insulating film on a semiconductor substrate and etching to create a trench for device isolation.
Career Highlights
Hidemi Kanetaka is currently employed at Kabushiki Kaisha Toshiba, where she continues to innovate in the semiconductor field. Her expertise in etching and surface treatment methods has positioned her as a key player in the development of advanced electronic devices.
Collaborations
Throughout her career, Kanetaka has collaborated with notable colleagues, including Masaru Nikaido and Hideki Yamaguchi. These partnerships have further enhanced her research and development efforts in semiconductor technology.
Conclusion
Hidemi Kanetaka's contributions to the field of semiconductor technology are noteworthy, and her innovative patents reflect her expertise and dedication. Her work continues to influence advancements in electronic device manufacturing.