This inventor holds 3 USPTO granted patents. Top assignees: Meidensha Corporation, Kabushiki Kaisha Meidensha, National Institute of Advanced Industrial Science. Active years: 2007-2012.
Location History:
- Ibaraki, JP (2007 - 2010)
- Tsukuba, JP (2012)
Company Filing History:
2 out of 312 
1 out of 246 
1 out of 11 
Years Active: 2007-2012
Title: Innovations by Hidehiko Nonaka
Introduction
Hidehiko Nonaka is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of oxide film formation, holding a total of 3 patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of oxide film production.
Latest Patents
One of his latest patents is a "Method for oxide film formation and apparatus for the method." This invention involves irradiating light in the ultraviolet range onto a substrate while supplying a starting gas of organosilicon and ozone gas. This process forms an oxide film on the substrate's surface. The ozone gas is mixed with the starting gas at room temperature, ensuring that the mixture quantity meets the chemical equivalent necessary for complete oxidation of the starting gas.
Another significant patent is the "Method and equipment for forming oxide film." This equipment includes a reactor that houses a heater unit for the substrate, along with piping systems for introducing material gas and ozone gas into the reactor. The valves operate to alternately supply these gases, while the heater unit adjusts the substrate temperature from room temperature to 400°C.
Career Highlights
Throughout his career, Hidehiko Nonaka has worked with prominent companies, including Meidensha Corporation and Kabushiki Kaisha Meidensha. His experience in these organizations has contributed to his expertise in the field of oxide film technology.
Collaborations
He has collaborated with notable coworkers such as Tetsuya Nishiguchi and Shingo Ichimura, further enhancing his innovative work in oxide film formation.
Conclusion
Hidehiko Nonaka's contributions to the field of oxide film formation through his patents and collaborations highlight his role as a significant inventor in Japan. His innovative methods and equipment continue to influence advancements in this technology.