The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2007

Filed:

Oct. 31, 2002
Applicants:

Tetsuya Nishiguchi, Tokyo, JP;

Hidehiko Nonaka, Ibaraki, JP;

Shingo Ichimura, Ibaraki, JP;

Inventors:

Tetsuya Nishiguchi, Tokyo, JP;

Hidehiko Nonaka, Ibaraki, JP;

Shingo Ichimura, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

When exposing a sample to be oxidizedto ozone gas so as to form an oxide film on the surface of the sample, an area to be oxidized is heated locally. Local heating is carried out with a light sourcefor irradiating infrared light the area to be oxidized of the sample on the susceptor, and heating means for heating the susceptor. Moreover, when exposing the sample to be oxidized to ozone gas, ozone gas is supplied to the sample while heating the sample under a given pressure. Said pressure is adjusted at 100–44,000 Pa, for example. The flow rate of ozone gas is adjusted, preferably, so that flow of ozone gas in a furnaceforms laminar flow. Moreover, it is desirable to provide a light source for emitting ultraviolet light. The light source for emitting ultraviolet light is arranged to irradiate the upstream side of the susceptor, for example.


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