The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Aug. 22, 2007
Tetsuya Nishiguchi, Numazu, JP;
Naoto Kameda, Tsukuba, JP;
Shigeru Saitou, Fuji, JP;
Hidehiko Nonaka, Tsukuba, JP;
Shingo Ichimura, Tsuchira, JP;
Tetsuya Nishiguchi, Numazu, JP;
Naoto Kameda, Tsukuba, JP;
Shigeru Saitou, Fuji, JP;
Hidehiko Nonaka, Tsukuba, JP;
Shingo Ichimura, Tsuchira, JP;
Meidensha Corporation, Tokyo, JP;
National Institute of Advanced Industrial Science and Technology, Tokyo, JP;
Abstract
In method and apparatus for oxide film formation, light in an ultraviolet light range is irradiated on a substrate, a starting gas of an organosilicon and an ozone gas are supplied to the substrate to form an oxide film on a surface of the substrate, and the ozone gas is mixed with the starting gas at room temperature and a mixture quantity of the ozone gas with the starting gas is set to be equal to a chemical equivalent or more necessary for totally oxidizing the starting gas.