Company Filing History:

11 out of 39,228

Fujitsu Corporation

patents

3 out of 2,253

Adv Antest Corporation

patents

where one patent can have more than one assignee

Years Active: 1992-2012

Loading Chart...

13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8223045 - D/A converter and electron beam exposure apparatus (2012-07-17),

2. 6399954 - Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operation (2002-06-04),

3. 6242751 - Charged-particle-beam exposure device and charged-particle-beam exposure method (2001-06-05),

4. 6072185 - Charged-particle-beam exposure device and method capable of high-speed (2000-06-06),

5. 5969365 - Charged-particle-beam exposure device and charged-particle-beam exposure (1999-10-19),

6. 5965895 - Method of providing changed particle beam exposure in which (1999-10-12),

7. 5910658 - Method and system for changed particle beam exposure (1999-06-08),

8. 5808313 - Charged particle beam exposure method and charged particle beam exposure (1998-09-15),

9. 5757015 - Charged-particle-beam exposure device and charged-particle-beam exposure (1998-05-26),

10. 5721432 - Method of and system for charged particle beam exposure (1998-02-24),

11. 5719402 - Method of and system for charged particle beam exposure (1998-02-17),

12. 5546319 - Method of and system for charged particle beam exposure (1996-08-13),

13. 5134398 - Digital-to-analog converter having a circuit for compensating for (1992-07-28),

Title: The Innovations of Hidefumi Yabara

Introduction

Hidefumi Yabara is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the fields of electronics and lithography, holding a total of 13 patents. His work focuses on advanced technologies that enhance the performance and reliability of electronic devices.

Latest Patents

Yabara's latest patents include a D/A converter and a charged-particle beam lithography apparatus. The D/A converter features a unique design that includes a base part with two D/A converter units for high and low order bits, along with a correction D/A converter part. This innovative design allows for precise error detection and correction, ensuring high-quality output. The charged-particle beam lithography apparatus is designed to detect abnormalities in the on-off operation of the charged-particle beam. It consists of several components, including a charged-particle beam generator and a digital converting circuit, which work together to maintain accurate control during the exposure process.

Career Highlights

Throughout his career, Yabara has worked with notable companies such as Fujitsu Corporation and Advantest Corporation. His experience in these organizations has allowed him to develop cutting-edge technologies that have had a lasting impact on the industry.

Collaborations

Yabara has collaborated with esteemed colleagues, including Hiroshi Yasuda and Isamu Seto. These partnerships have fostered innovation and contributed to the advancement of technology in their respective fields.

Conclusion

Hidefumi Yabara's contributions to electronics and lithography demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of complex systems and a drive to improve technological processes.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.