This inventor holds 15 USPTO granted patents and 4 published patent applications. Top assignees: Nec Corporation, National Institute of Advanced Industrial Science and Technology, National Institute for Materials Science. Active years: 1997-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Minato-ku, JP (2012)
- Tokyo, JP (1997 - 2015)
Company Filing History:



Years Active: 1997-2015
Title: Innovations of Hidefumi Hiura in Graphene Technology
Introduction
Hidefumi Hiura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of graphene technology, holding a total of 15 patents. His work focuses on innovative methods for manufacturing graphene substrates, which have important applications in semiconductor devices.
Latest Patents
Among his latest patents, Hiura has developed a method of manufacturing graphene substrate. This method involves bringing a metal layer into contact with a carbon-containing layer and heating the metal layer to dissolve carbon into it. Upon cooling, the carbon precipitates as graphene on any substrate surface. Another notable patent is for a manufacturing method of a graphene-on-insulator substrate, which is designed to be mass productive and of high quality. This method allows for the direct use of the substrate in semiconductor device manufacturing at a low cost.
Career Highlights
Hiura has worked with notable organizations such as NEC Corporation and the National Institute of Advanced Industrial Science and Technology. His experience in these institutions has greatly influenced his research and development in graphene technology.
Collaborations
Some of his notable coworkers include Toshihiko Kanayama and Tetsuya Tada. Their collaborative efforts have contributed to advancements in the field of graphene and its applications.
Conclusion
Hidefumi Hiura's innovative work in graphene technology has positioned him as a key figure in the field. His patents reflect a commitment to advancing manufacturing methods that are both efficient and cost-effective.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile