This inventor holds 4 USPTO granted patents and 8 published patent applications and 1 EPO patent. Top assignee: Kurita Water Industries Ltd.. Active years: 2016-2026.
Company Filing History:
Years Active: 2016-2026
Title: Innovations by Hideaki Iino
Introduction
Hideaki Iino is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical supply devices, particularly in the context of wafer washing technology. With a total of 4 patents to his name, Iino's work reflects a commitment to enhancing efficiency and precision in industrial applications.
Latest Patents
One of Iino's latest inventions is the "Dilute Chemical Supply Device." This device comprises a dilute chemical solution preparation unit that prepares a dilute chemical solution, a reservoir for the prepared solution, and a supply mechanism that delivers the solution to multiple single-wafer type washers. The device also includes a return mechanism that refluxes excess water back to the reservoir. This innovation allows for accurate concentration adjustments of the dilute chemical solution while minimizing excess water discharge, making it ideal for wafer washing.
Another significant patent is the "Method and Apparatus for Supplying Water of Specified Concentration." This invention outlines a method for producing water of specified concentration by adding a conductive first liquid and a non-conductive second liquid to ultrapure water. The method ensures that the conductivity or specific resistance of the ultrapure water meets specified values, enhancing the precision of water supply in various applications.
Career Highlights
Hideaki Iino is currently employed at Kurita Water Industries Ltd., a company known for its expertise in water treatment solutions. His role at Kurita has allowed him to focus on developing innovative technologies that address the needs of the semiconductor industry and other sectors requiring high-purity water.
Collaborations
Iino has collaborated with several professionals in his field, including Mitsuharu Terashima and Mamoru Iwasaki. These collaborations have contributed to the advancement of technologies related to chemical supply and water treatment.
Conclusion
Hideaki Iino's contributions to the field of chemical supply devices demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a deep understanding of the challenges faced in wafer washing and water treatment, positioning him as a key figure in his industry.