The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2024

Filed:

Sep. 15, 2020
Applicant:

Kurita Water Industries Ltd., Tokyo, JP;

Inventor:

Hideaki Iino, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F 23/40 (2022.01); B01F 35/21 (2022.01); B01F 35/221 (2022.01); B01F 35/71 (2022.01); B01F 101/24 (2022.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B01F 23/483 (2022.01); B01F 35/2112 (2022.01); B01F 35/2132 (2022.01); B01F 35/2211 (2022.01); B01F 35/717613 (2022.01); H01L 21/6704 (2013.01); B01F 2101/24 (2022.01);
Abstract

The dilute chemical solution supply device () comprises: a dilute chemical solution preparation unit () that prepares a dilute chemical solution (W); a reservoir () for the prepared dilute chemical solution; a dilute chemical solution adjustment/supply mechanism () that supplies, as washing water (W), the dilute chemical solution (W) stored in the reservoir () to a plurality of single-wafer type washers (A,B, andC); and a return mechanism that is connected to each of the single-wafer type washers (A,B, andC) and refluxes excess water from the single-wafer type washers to the reservoir (). According to such a dilute chemical solution supply device, it is possible to accurately adjust the concentration of the solute of the dilute chemical solution and suppress the discharge of excess water, and the dilute chemical solution supply device is thus suitable for washing of wafers, etc.


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