Heungsik Park

Title: Heungsik Park: Innovator in Semiconductor Technology

Introduction

Heungsik Park is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on innovative designs that enhance the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents, Heungsik Park has developed a semiconductor device featuring a ring-shaped protection spacer above a contact pad, which encloses a source/drain contact plug. This invention includes a gate pattern that crosses over a substrate, comprising a gate insulating layer, a gate electrode, and a gate capping pattern that are sequentially stacked. The design also incorporates a gate spacer covering the sidewall of the gate pattern, a source/drain pattern adjacent to the gate pattern, and a contact pad on the source/drain pattern. Notably, the top surface of the contact pad is lower than that of the gate electrode, and a source/drain contact plug is positioned on the contact pad, with a protection spacer between the gate spacer and the source/drain contact plug.

Career Highlights

Heungsik Park is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His innovative designs have not only contributed to the advancement of the company but have also set new standards in the industry.

Collaborations

Heungsik Park has collaborated with notable coworkers, including Doo-Young Lee and Hongsik Shin. Their combined expertise has fostered a creative environment that encourages groundbreaking innovations in semiconductor technology.

Conclusion

Heungsik Park's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence the development of advanced semiconductor devices, ensuring a lasting impact on the industry.