Dresden, Germany

Hermann Sachse

USPTO Granted Patents = 4 


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2004-2009

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: The Innovations of Hermann Sachse: Pioneering Semiconductor Technologies

Introduction

Hermann Sachse, based in Dresden, Germany, is an esteemed inventor known for his significant contributions to the field of semiconductor technology. With a total of four patents to his name, Sachse has played a vital role in the advancement of innovative methods that improve the functionality and efficiency of semiconductor devices.

Latest Patents

Hermann Sachse's latest patents showcase groundbreaking methodologies in semiconductor manufacturing. One of his key inventions is a method of forming a doped portion of a semiconductor substrate. This process includes defining several protruding portions on the substrate surface, followed by the application of a pattern layer. An ion implantation procedure is then conducted, allowing for precise doping of specific substrate portions while achieving favorable angles for ion penetration. The removal of the pattern layer completes this sophisticated method.

Another notable patent involves the creation of a photolithographic mask with half-tone main features and perpendicular half-tone assist features. This innovative mask enables the exposure of radiation-sensitive resist layers on semiconductor substrates. The design incorporates a radiation-transmissive substrate with a half-tone layer that cleverly distinguishes main features from assist features to ensure the accurate transfer of patterns during the irradiation process.

Career Highlights

Throughout his career, Hermann Sachse has demonstrated exceptional expertise in semiconductor technology, contributing significantly to advancements in the field. His role at Infineon Technologies AG has positioned him as a leading figure in developing novel solutions that address current challenges in semiconductor fabrication.

Collaborations

Hermann has worked alongside talented colleagues such as Albrecht Kieslich and Tobias Mono. Together, they have forged strong partnerships that facilitate innovation and drive the advancement of semiconductor technologies.

Conclusion

In summary, Hermann Sachse stands out as an influential inventor whose work is shaping the future of semiconductor applications. With his creative methodologies and collaborative spirit at Infineon Technologies AG, Sachse continues to contribute to vital technological advancements that enhance our digital world. His patents not only reflect his ingenuity but also underscore the importance of innovation in today’s rapidly evolving technological landscape.

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