The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2005

Filed:

Aug. 23, 2002
Applicants:

Albrecht Kieslich, Radebeul, DE;

Hermann Sachse, Dresden, DE;

Inventors:

Albrecht Kieslich, Radebeul, DE;

Hermann Sachse, Dresden, DE;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 900 ;
U.S. Cl.
CPC ...
Abstract

A mask for fabricating semiconductor components contains first transparent regions and second transparent regions. The second regions are laid out such that they do not act on the regions of the photoresist directly beneath them in the exposure of the photoresist through the mask. The transparent regions define a size and a shape of structures to be formed.


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