He Gao

Title: He Gao: Innovator in Block Copolymer Technologies

Introduction

He Gao is a prominent inventor based in San Jose, CA (US), known for his significant contributions to the field of block copolymers. With a total of 5 patents, Gao has developed innovative methods that enhance the manufacturing processes of imprint templates and directed self-assembly techniques.

Latest Patents

Gao's latest patents include an "Imprint template with optically-detectable alignment marks and method for making using block copolymers." This invention utilizes directed self-assembly of block copolymers (BCPs) to create imprint templates with precise patterns for both active and non-active areas. The method involves a lithographic technique that defines a chemical contrast pattern, allowing for the formation of alignment marks that are optically detectable.

Another notable patent is the "Method for directed self-assembly (DSA) of block copolymers." This technique employs a patterned sublayer on a substrate to guide the chemical prepatterning of BCPs, resulting in more uniform and denser patterns. The process includes depositing a blend of BCP and functional homopolymers, which undergoes annealing to achieve a favorable chemical pattern for DSA. The innovative approach allows for the selective distribution of inks and the creation of alternating lines of BCP components.

Career Highlights

He Gao is currently employed at HGST Netherlands, B.V., where he continues to push the boundaries of polymer technology. His work has been instrumental in advancing the applications of block copolymers in various industries.

Collaborations

Gao collaborates with talented colleagues, including Lei Wan and Kanaiyalal Patel, who contribute to his innovative projects and research endeavors.

Conclusion

He Gao's work in the field of block copolymers showcases his dedication to innovation and excellence. His patents reflect a deep understanding of material science and a commitment to advancing technology in meaningful ways.