The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Apr. 06, 2015
Hgst Netherlands B.v., Amsterdam, NL;
HGST Netherlands B.V., Amsterdam, NL;
Abstract
In directed self-assembly (DSA) of a block copolymer (BCP), a patterned sublayer on a substrate serves as a guiding chemical prepattern on which BCPs form more uniform and/or denser patterns. A layer of a blend of a BCP and functional homopolymers, referred to as inks, is deposited on the patterned sublayer and annealed to change the initial chemical prepattern to a 1:1-like chemical pattern that is more favorable to DSA. After annealing, the inks selectively distribute into blocks by DSA, and part of the inks graft on the substrate underneath the blocks. The BCP blend layer is then rinsed away, leaving the grafted inks. A second layer of BCP is then deposited and annealed as a second DSA step to form alternating lines of the BCP components. One of the BCP components is removed, leaving lines of the other BCP component as a mask for patterning the substrate.