The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9377683 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 28, 2016

Filed:

Mar. 22, 2013
Applicant:

Hgst Netherlands B.v., Amsterdam, NL;

Inventors:

He Gao, San Jose, CA (US);

Lei Wan, San Jose, CA (US);

Assignee:

HGST Netherlands B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); G03F 7/00 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0035 (2013.01); G03F 7/0002 (2013.01); H01L 21/308 (2013.01);
Abstract

A method using directed self-assembly of block copolymers (BCPs) for making an imprint template has the required patterns for both the features in the template's active area and the optically-detectable alignment marks in the template's non-active area. A chemical contrast pattern defined by a lithographic technique forms patterns of lines in both the active area and non-active area, as well as patterns of featureless gap regions in the non-active area. The pattern of lines has the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of featureless gap regions has the BCP components aligned as lamellae parallel to the substrate. The patterns of lines and featureless gap regions in the non-active area define the optically detectable alignment marks. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate the imprint template.


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