Location History:
- Ohte, JP (1995)
- Chiyoda-ku, JP (2003)
- Tokyo, JP (1991 - 2015)
Company Filing History:
7 out of 1,530 
2 out of 65 
1 out of 68 
Years Active: 1991-2015
Title: Haruhiko Asao: Innovator in Copper Technology
Introduction
Haruhiko Asao is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of copper technologies. With a total of 8 patents to his name, Asao's work has had a substantial impact on the manufacturing processes of electronic components.
Latest Patents
Among his latest patents is a sputtering target for forming wiring films of flat panel displays. This invention involves a copper alloy wiring film that includes a specific composition of magnesium, manganese, aluminum, and copper, which enhances the performance of flat panel displays. Another notable patent is a method for manufacturing low-oxygen copper. This method allows for the production of high-quality low-oxygen copper wire with superior surface quality, utilizing a series of innovative steps to ensure minimal impurities and defects during the manufacturing process.
Career Highlights
Throughout his career, Haruhiko Asao has worked with esteemed organizations such as Mitsubishi Materials Corporation and the Railway Technical Research Institute. His experience in these companies has allowed him to refine his expertise in materials science and contribute to groundbreaking advancements in copper technology.
Collaborations
Asao has collaborated with notable colleagues, including Yutaka Koshiba and Takuro Iwamura. These partnerships have fostered a collaborative environment that has led to innovative solutions in the field.
Conclusion
Haruhiko Asao's contributions to the field of copper technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the manufacturing processes of electronic components, showcasing the importance of innovation in advancing technology.