Harold M Persing

Title: Harold M. Persing: Innovator in Plasma Processing Technology

Introduction

Harold M. Persing is a notable inventor based in Rockport, MA (US), recognized for his contributions to plasma processing technology. With a total of 8 patents to his name, Persing has made significant advancements in methods that enhance the efficiency and effectiveness of plasma processing.

Latest Patents

Among his latest patents, Persing has developed a method titled "Pulsed plasma to affect conformal processing." This innovative plasma processing method utilizes the after-glow of a pulsed power plasma to perform conformal processing. During this afterglow phase, the equipotential field lines align with the contours of the workpiece surface, enabling ions to be introduced at various incident angles, particularly beneficial for non-planar surfaces. Additionally, the method allows for the platen to be positively biased during the plasma afterglow, attracting negative ions towards the workpiece. This technique facilitates various conformal processing steps, including implantation, etching, and deposition.

Another significant patent is "Closed loop process control of plasma processed materials." This invention presents a plasma processing apparatus and method that enhance the repeatability of various plasma processes. The implanted dose is influenced by implant conditions and other parameters. This method leverages current implant conditions and historical data to improve repeatability. In one embodiment, a plasma is generated, and a first sensing system monitors the plasma composition while a second system tracks the total number of ions implanted. The information gathered is used to control operating parameters within the plasma chamber, ensuring optimal performance.

Career Highlights

Harold M. Persing is currently associated with Varian Semiconductor Equipment Associates, Inc., where he continues to innovate in the field of plasma processing. His work has significantly impacted the semiconductor industry, providing solutions that enhance manufacturing processes.

Collaborations

Throughout his career, Persing has collaborated with talented individuals such as Vikram Singh and Ziwei Fang, contributing to the advancement of plasma processing technologies.

Conclusion

Harold M. Persing's contributions to plasma processing technology have established him as a leading inventor in his field. His innovative patents and ongoing work at Varian Semiconductor Equipment Associates, Inc. continue to influence the industry positively.