The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2008
Filed:
Sep. 16, 2005
Vikram Singh, North Andover, MA (US);
Edmund J. Winder, Waltham, MA (US);
Harold M. Persing, Rockport, MA (US);
Timothy Jerome Miller, South Hamilton, MA (US);
Ziwei Fang, Beverly, MA (US);
Atul Gupta, Beverly, MA (US);
Vikram Singh, North Andover, MA (US);
Edmund J. Winder, Waltham, MA (US);
Harold M. Persing, Rockport, MA (US);
Timothy Jerome Miller, South Hamilton, MA (US);
Ziwei Fang, Beverly, MA (US);
Atul Gupta, Beverly, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A technique for boron implantation is disclosed. In one particular exemplary embodiment, the technique may be realized by an apparatus for boron implantation. The apparatus may comprise a reaction chamber. The apparatus may also comprise a source of pentaborane coupled to the reaction chamber, wherein the source is capable of supplying a substantially pure form of pentaborane into the reaction chamber. The apparatus may further comprise a power supply that is configured to energize the pentaborane in the reaction chamber sufficiently to produce a plasma discharge having boron-bearing ions.