San Jose, CA, United States of America

Haoyan Sha

This inventor holds 3 USPTO granted patents and 4 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.

USPTO Granted Patents = 3 

Average Co-Inventor Count = 7.5

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Haoyan Sha: Innovator in Semiconductor Technologies

Introduction

Haoyan Sha is a prominent inventor based in San Jose, CA, specializing in semiconductor technologies. He has made significant contributions to the field, holding a total of 3 patents that focus on improving semiconductor structures and device performance.

Latest Patents

One of his latest patents is titled "Titanium nitride gapfill processes for semiconductor structures." This patent describes methods for forming structures that are beneficial for front-end-of-line (FEOL) and back-end-of-line (BEOL) processes. The methods involve depositing titanium nitride (TiN) as a gapfill material in high aspect ratio structures with small dimensions. The embodiments provide seam-free, high-quality TiN films that effectively fill high aspect ratio trenches. Additionally, the patent includes selective deposition processes using a carbon layer to achieve seam-free TiN gapfill in three-dimensional structures, such as gate-all-around (GAA) devices.

Another notable patent focuses on "Methods of improving PMOS transistor performance." This patent outlines methods for manufacturing electronic devices, particularly transistors, by inhibiting the growth of the N-metal layer. The disclosure presents two types of processes that significantly reduce or inhibit N-metal layer growth on the titanium nitride surface of PMOS transistors. These processes involve forming a self-assembled monolayer on the metal surface and creating a silicon-containing layer on the TiN surface.

Career Highlights

Haoyan Sha is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to cutting-edge technologies that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, Haoyan has collaborated with notable colleagues, including Janardhan Devrajan and Yongjing Lin. These collaborations have fostered innovation and advancement in semiconductor technologies.

Conclusion

Haoyan Sha is a distinguished inventor whose work in semiconductor technologies has led to significant advancements in the field. His patents reflect a commitment to improving device performance and manufacturing processes. His contributions continue to shape the future of semiconductor technology.

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