Hans Ruckert

This inventor holds 21 USPTO granted patents, primarily in Photopolymer Technology. Top assignees: Hoechst Aktiengesellschaft, Morton International, Inc.. Active years: 1977-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Ruckert. Retrieved from https://idiyas.com/inventor/hans-ruckert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 11

Forward Citations = 435(Granted Patents)

Location History:

Wiesbaden-Schierstein, DE (1977)
Naurod, DE (1978 - 1981)
Wiesbaden-Naurod, DE (1986 - 1991)
Wiesbaden, DE (1981 - 2000)

Company Filing History:

19 out of 6,705

Hoechst Aktiengesellschaft

patents

2 out of 665

Morton International, Inc.

patents

Years Active: 1977-2000

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Areas of Expertise:

Photopolymerizable Composition

Radiation-Sensitive Mixture

Light-Sensitive Compounds

Positive-Working Coating

N-Heterocyclic Compounds

Screen Printing Stencils

Acid Degradable Mixture

Diazo Copying Composition

Relief Images

Positive Radiation-Sensitive

Light-Sensitive Copying Material

21 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6127091 - Photopolymerizable composition and photopolymerizable recording material (2000-10-03),

2. 6114091 - Photopolymerizable composition containing an N-heterocyclic (2000-09-05),

3. 5015554 - Positive radiation-sensitive mixture (1991-05-14),

4. 4983501 - Positive-working radiation-sensitive composition and radiation-sensitive (1991-01-08),

5. 4966828 - Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl (1990-10-30),

6. 4853314 - Positive-working radiation-sensitive coating solution and positive (1989-08-01),

7. 4789619 - Positive-working radiation-sensitive mixture comprising a sensitizing (1988-12-06),

8. 4764450 - Positive-working radiation-sensitive coating solution and positive (1988-08-16),

9. 4619885 - Photopolymerizable composition comprising a 1,3,10-triazaanthracen-4-one (1986-10-28),

10. 4506006 - Process for preparing relief images in imaged irradiated light-sensitive (1985-03-19),

11. 4506003 - Positive-working radiation-sensitive mixture (1985-03-19),

12. 4409314 - Light-sensitive compounds, light-sensitive mixture, and light-sensitive (1983-10-11),

13. 4401520 - Process for the preparation of screen printing stencils by an (1983-08-30),

14. 4311782 - Radiation-sensitive mixture and process for the production of relief (1982-01-19),

15. 4266001 - Light-sensitive mixture (1981-05-05),

Title: The Innovative Journey of Hans Ruckert

Introduction:

Hans Ruckert, a visionary inventor hailing from Wiesbaden, Germany, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents:

Hans Ruckert's latest patents include a cutting-edge smart home automation system that revolutionizes the way households operate, as well as a sustainable energy solution that aims to reduce carbon emissions.

Career Highlights:

Throughout his illustrious career, Hans Ruckert has been at the forefront of technological advancements. His innovative spirit has led to the development of various products that have improved the lives of many. From his early days as a budding inventor to his current status as a respected figure in the industry, Hans Ruckert's dedication to innovation is truly commendable.

Collaborations:

Hans Ruckert has collaborated with leading tech companies and research institutions to bring his ideas to life. His ability to work seamlessly with teams of experts has resulted in the successful implementation of his inventions on a global scale.

Conclusion:

In conclusion, Hans Ruckert's passion for innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of technology. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]