The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 1990
Filed:
Sep. 13, 1984
Applicant:
Inventors:
Reinhard Doenges, Bad Soden, DE;
Hans Ruckert, Wiesbaden-Naurod, DE;
Ulrich Geissler, Frankfurt am Main, DE;
Hartmut Steppan, Wiesbaden-Dotzheim, DE;
Assignee:
Hoechst Aktiengesellschaft, Frankfurt, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ; G03F / ; C07D / ;
U.S. Cl.
CPC ...
430281 ; 430922 ; 430270 ; 430280 ; 430343 ; 430292 ; 522 34 ; 522 45 ; 548491 ; 548217 ; 548150 ; 548148 ; 548180 ; 548147 ; 548120 ; 548121 ; 546174 ;
Abstract
Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.