Hoechst Aktiengesellschaft

Morton International, Inc.

Hans Ruckert

Gerhard Buhr

Ulrich Geissler

Hartmut Steppan

Hans-Dieter Frommeld

Jurgen Sander

Barbara Wildenhain

Ralf Ohlenmacher

Rainer Wingen

Paul Stahlhofen

Reinhard Doenges

Hans W Frass

Gabriele Lambert

Rainer Unholz

Joachim Knaul

A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.

Photopolymerizable composition and photopolymerizable recording material

Photopolymerizable composition containing an N-heterocyclic

A radiation-sensitive mixture is described comprising a compound which produces a strong acid under the action of actinic radiation, a binder which is insoluble in water, but soluble in organic solvents and aqueous-alkaline solutions, and a compound of either of formulae I and II ##STR1## wherein R denotes a substituted or unsubstituted alkyl group,

Positive radiation-sensitive mixture

A positive-working radiation-sensitive composition is described, which comprises a binder which is insoluble in water and soluble or swellable in organic solvents and in aqueous-alkaline solutions, a compound which forms a strong acid upon irradiation, and a compound of the general formula ##STR1## wherein R denotes an alkyl group which may be substituted and

Positive-working radiation-sensitive composition and radiation-sensitive

Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.

Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl

A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C-O-C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

Positive-working radiation-sensitive coating solution and positive

A positive-working radiation-sensitive mixture is described that contains (a) a radiation-sensitive compound which forms a strong acid under the action of actinic radiation, (b) a compound with at least one C--O--C bond cleavable by acid, (c) a binder which is insoluble in water but soluble in aqueous-alkaline solutions, and (d) a polymethine dye. The polymethine dyes used are hemioxonol dyes or symmetrical cyanine dyes. In the light-sensitive mixture, these dyes effect high sensitization and high image sharpness contrast which, in addition, is substantially irreversible.

Positive-working radiation-sensitive mixture comprising a sensitizing

A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C--O--C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

A photopolymerizable composition is disclosed which comprises (a) a polymeric binder, (b) a polymerizable compound, and (c) a photoinitiator comprised of a compound according to formula I ##STR1## wherein R.sup.1 is a hydrogen atom, a halogen atom, an alkyl group, alkoxy group, or dialkylamino group,

Photopolymerizable composition comprising a 1,3,10-triazaanthracen-4-one

A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

Positive-working radiation-sensitive mixture

A process is described for preparing relief images, in which a light-sensitive material composed of a support and a light-sensitive layer which contains as essential constituents

Process for preparing relief images in imaged irradiated light-sensitive

A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I ##STR1## in which R.sup.1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R.sup.2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.

Light-sensitive compounds, light-sensitive mixture, and light-sensitive

This invention relates to an improvement in the process for the preparation of screen printing stencils by an electroplating method, which comprises coating a metallic matrix, provided in the manner of a screen with dots of insulating material, with a photoresist layer, exposing the photoresist layer imagewise and developing it by washing out, and rendering those areas of the photoresist layer which have remained in place electrically conductive in the course of imaging, electrodepositing metal up to a desired height on the conductive image stencil and on the matrix ridges surrounding the insulating screen dots, and removing the patterned screen printing stencil thus obtained from the matrix, the improvement which comprises rendering the photoresist layer conductive only on its surface and before developing.

Process for the preparation of screen printing stencils by an

A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R.sup.2, R.sup.3 and R.sup.5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R.sup.4 denotes an alkylene group or --if a.sub.1 =a.sub.2 =1-- also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R.sup.6 denotes a hydrogen atom or a methyl group, a.sub.1 and a.sub.2 each denote, 0, 1 or 2, a.sub.1 +a.sub.2 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

Radiation-sensitive mixture and process for the production of relief

A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula ##STR1## in which R.sub.1, R.sub.1 ', R.sub.2 and R.sub.2 ' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R.sub.3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2-naphthoquinone-2-diazide-sulfonyl group. The new naphthoquinone diazides are distinguished by a high solubility in organic solvents and by good reprographic properties.

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Wiesbaden, Germany

Hans Ruckert