The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1982
Filed:
Jul. 15, 1980
Gerhard Buhr, Konigstein, DE;
Hans Ruckert, Wiesbaden, DE;
Hoechst Aktiengesellschaft, , DE;
Abstract
A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R.sup.2, R.sup.3 and R.sup.5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R.sup.4 denotes an alkylene group or --if a.sub.1 =a.sub.2 =1-- also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R.sup.6 denotes a hydrogen atom or a methyl group, a.sub.1 and a.sub.2 each denote, 0, 1 or 2, a.sub.1 +a.sub.2 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.