Hans-Jürgen Stock

Title: Innovations by Hans-Jürgen Stock

Introduction

Hans-Jürgen Stock is a notable inventor based in Dachau, Germany. He has made significant contributions to the field of computational lithography, particularly through his innovative use of machine learning. With a total of three patents to his name, Stock continues to push the boundaries of technology in his field.

Latest Patents

One of Stock's latest patents focuses on machine learning for selecting initial source shapes for source mask optimization. In this invention, initial source shapes for source mask optimization are determined based on a layout of the lithographic mask. The process begins with receiving a layout of a lithographic mask, followed by the selection of different sections of the mask, referred to as clips. These clips are then applied to a machine learning model, which infers source shapes from the clips. The inferred source shapes serve as the initial source shapes for source mask optimization.

Another significant patent involves large-scale computational lithography using machine learning models. In this process, an aerial image produced by a lithographic mask is first calculated using a two-dimensional model of the mask. This initial aerial image is then applied to a first machine learning model, which infers a second aerial image. The first machine learning model is trained using a training set that includes aerial images calculated with a more accurate three-dimensional model of lithographic masks. Although the two-dimensional model is faster to compute, it is less accurate. The first machine learning model effectively mitigates this inaccuracy.

Career Highlights

Hans-Jürgen Stock is currently employed at Synopsys, Inc., where he continues to develop innovative solutions in the field of lithography. His work has been instrumental in advancing the capabilities of computational lithography, making significant strides in efficiency and accuracy.

Collaborations

Stock has collaborated with notable colleagues, including Dereje Shewaseged Woldeamanual and Thomas Heribert Mülders. These collaborations have further enriched his work and contributed to the advancements in their shared field.

Conclusion

Hans-Jürgen Stock's contributions to the field of computational lithography through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.