The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jun. 01, 2022
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventors:
William A. Stanton, Meridian, ID (US);
Sylvain Berthiaume, Gatineau, CA;
Hans-Jürgen Stock, Dachau, DE;
Jay A. Hiserote, Hillsboro, OH (US);
Assignee:
Synopsys, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/27 (2020.01); G03F 1/70 (2012.01); G03F 7/00 (2006.01); G06F 30/30 (2020.01); G06F 30/398 (2020.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G06F 30/27 (2020.01); G03F 1/70 (2013.01); G03F 7/705 (2013.01); G03F 7/706841 (2023.05); G06F 30/398 (2020.01); G06N 3/08 (2013.01);
Abstract
Initial source shapes for source mask optimization are determined based on a layout of the lithographic mask. In one approach, a layout of a lithographic mask is received. Different sections of the lithographic mask, referred to as clips, are selected. These clips are applied to a machine learning model which infers source shapes from the clips. The inferred source shapes are used as the initial source shapes for source mask optimization.