Location History:
- Meridian, ID (US) (2022)
- Mountain View, CA (US) (2023)
Company Filing History:
Years Active: 2022-2025
Title: Innovations by William Stanton
Introduction
William Stanton is an accomplished inventor based in Meridian, ID (US). He has made significant contributions to the field of semiconductor device fabrication, holding a total of three patents. His work focuses on optimizing source masks through advanced machine learning techniques.
Latest Patents
One of Stanton's latest patents is titled "Machine learning for selecting initial source shapes for source mask optimization." This invention involves determining initial source shapes based on the layout of a lithographic mask. The process begins with receiving a layout of the mask, followed by selecting different sections known as clips. These clips are then applied to a machine learning model that infers source shapes, which are subsequently used for source mask optimization.
Another notable patent is "Source mask optimization by process defects prediction." This method generates a mask for semiconductor fabrication by selecting a source candidate and creating a process simulation model that includes defect rates. The process involves performing optical proximity correction (OPC) on the mask data, assessing lithographic evaluation metrics, and computing costs to determine if they meet a threshold condition. If the costs do not satisfy the condition, a different source candidate is selected.
Career Highlights
William Stanton is currently employed at Synopsys, Inc., where he continues to innovate in the semiconductor industry. His expertise in machine learning and lithography has positioned him as a key player in advancing semiconductor technology.
Collaborations
Stanton has collaborated with notable colleagues, including Sylvain Berthiaume and Lawrence S Melvin, III. These partnerships have contributed to the development of his innovative patents and have enhanced the collaborative environment at Synopsys, Inc.
Conclusion
William Stanton's contributions to the field of semiconductor device fabrication through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.