Hans-Joachim Frasch

Title: The Innovations of Hans-Joachim Frasch

Introduction

Hans-Joachim Frasch is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of optical sensors and illumination systems, holding a total of 2 patents. His work has advanced the technology used in coordinate measuring machines and lithography.

Latest Patents

Frasch's latest patents include a method for simulating image recording in a coordinate measuring machine. This invention involves providing data sets that represent models of the measurement object, illumination, and optics of the optical sensor. The method renders an image stack that contains multiple virtual images of the measurement object, enhancing the inspection process. Another significant patent is an illumination system with field mirrors designed for uniform scanning energy, particularly for wavelengths ≤193 nm, which is crucial for EUV lithography. This system features aspheric field mirrors or lenses that improve the quality of illumination.

Career Highlights

Throughout his career, Hans-Joachim Frasch has worked with prominent companies such as Carl Zeiss SMT AG and Carl Zeiss Industrielle Messtechnik GmbH. His experience in these organizations has allowed him to develop and refine his innovative ideas in optical technology.

Collaborations

Frasch has collaborated with notable colleagues, including Wolfgang Singer and Joachim Hainz. These partnerships have contributed to the advancement of his inventions and the overall progress in the field.

Conclusion

Hans-Joachim Frasch's contributions to optical sensors and illumination systems have made a lasting impact on technology. His innovative patents and collaborations reflect his dedication to advancing the field of measurement and imaging.