The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Apr. 20, 2004
Wolfgang Singer, Aalen, DE;
Joachim Hainz, Aalen, DE;
Hans-joachim Frasch, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Joachim Wietzorrek, Aalen, DE;
Jörg Schultz, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Joachim Hainz, Aalen, DE;
Hans-Joachim Frasch, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Joachim Wietzorrek, Aalen, DE;
Jörg Schultz, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.