Company Filing History:

10 out of 180

Leybold-heraeus Gmbh

patents

3 out of 393

Leybold Aktiengesellschaft

patents

2 out of 40

Leybold-heraeus Gmbh & Co. Kg

Years Active: 1980-1990

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 4966677 - Cathode sputtering apparatus on the magnetron principle with a hollow (1990-10-30),

2. 4885070 - Method and apparatus for the application of materials (1989-12-05),

3. 4821791 - Melting furnace for producing strand-cast ingots in a protective gas (1989-04-18),

4. 4648347 - Vacuum depositing apparatus (1987-03-10),

5. 4572776 - Magnetron cathode for sputtering ferromagnetic targets (1986-02-25),

6. 4295808 - Apparatus for the production of high-purity metal powder by means of (1981-10-20),

7. 4258645 - Coupling for stationary and movable vacuum chambers (1981-03-31),

8. 4238525 - Method and apparatus for vacuum depositing thin coatings using electron (1980-12-09),

9. 4237148 - Method of vaporizing alloys of metals having different vapor pressures (1980-12-02),

10. 4233342 - Method for vapor-coating turbine buckets (1980-11-11),

11. 4230739 - Method of evaporating melts of alloys of metals having different vapor (1980-10-28),

12. 4226587 - Heating system for vacuum coating apparatus (1980-10-07),

13. 4218410 - Method for the production of high-purity metal powder by means of (1980-08-19),

14. 4208042 - Evaporating crucible (1980-06-17),

15. 4192253 - Vacuum coating apparatus (1980-03-11),

Title: Innovations of Hans Aichert

Introduction

Hans Aichert is a notable inventor based in Hanau am Main, Germany. He has made significant contributions to the field of sputtering technology, holding a total of 16 patents. His work has advanced the methods and apparatuses used for material application in various industries.

Latest Patents

Aichert's latest patents include a cathode sputtering apparatus based on the magnetron principle. This innovative device features a hollow cathode with a cylindrical sputtering surface and a cooling passage. The design incorporates a magnet system that creates a rotationally symmetrical tunnel of magnetic lines of force, enhancing the efficiency of the sputtering process. Another notable patent involves an apparatus for applying materials to a substrate within a vacuum chamber, utilizing a separate generator chamber to form a plasma guided by magnets.

Career Highlights

Throughout his career, Hans Aichert has worked with prominent companies such as Leybold-Heraeus GmbH and Leybold Aktiengesellschaft. His expertise in sputtering technology has positioned him as a key figure in the development of advanced manufacturing processes.

Collaborations

Aichert has collaborated with notable colleagues, including Herbert Stephan and Walter Dietrich. These partnerships have contributed to the innovation and refinement of his patented technologies.

Conclusion

Hans Aichert's contributions to sputtering technology and his extensive patent portfolio highlight his impact on the field of material application. His work continues to influence advancements in manufacturing processes.

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