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For the Inventor, By the Inventor

Hanau, Germany

Hans Aichert

This inventor holds 16 USPTO granted patents, primarily in Vacuum Coating Technology. Top assignees: Leybold-Heraeus Gmbh, Leybold Aktiengesellschaft, Leybold-Heraeus Gmbh & Co. Kg. Active years: 1980-1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Aichert. Retrieved from https://idiyas.com/inventor/hans-aichert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16

% Patents Active = 100.0

Average Co-Inventor Count = 4.1

ph-index = 10

Forward Citations = 214(Granted Patents)


Location History:

  • Hanau, DE (1989)
  • Hanau am Main, DE (1980 - 1990)

Company Filing History:

goldMedal10 out of 180 
 
Leybold-Heraeus Gmbh
 patents
silverMedal3 out of 393 
 
Leybold Aktiengesellschaft
 patents
bronzeMedal2 out of 40 
 
Leybold-Heraeus Gmbh & Co. Kg
 patents
4. 1 out of 1 
 
Leybold-Hereaus Gmbh
 patent

Years Active: 1980-1990

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Areas of Expertise:
Cathode Sputtering
Vacuum Deposition
Thin Coatings
High-Purity Metal Powder
Magnetron Cathode
Protective Gas
Evaporating Crucible
Vaporizing Alloys
Heating System
Lock Chambers
Vacuum Chambers
Turbine Buckets
16 patents (USPTO):Explore Patents
1. 4966677 - Cathode sputtering apparatus on the magnetron principle with a hollow (1990-10-30),
2. 4885070 - Method and apparatus for the application of materials (1989-12-05),
3. 4821791 - Melting furnace for producing strand-cast ingots in a protective gas (1989-04-18),
4. 4648347 - Vacuum depositing apparatus (1987-03-10),
5. 4572776 - Magnetron cathode for sputtering ferromagnetic targets (1986-02-25),
6. 4295808 - Apparatus for the production of high-purity metal powder by means of (1981-10-20),
7. 4258645 - Coupling for stationary and movable vacuum chambers (1981-03-31),
8. 4238525 - Method and apparatus for vacuum depositing thin coatings using electron (1980-12-09),
9. 4237148 - Method of vaporizing alloys of metals having different vapor pressures (1980-12-02),
10. 4233342 - Method for vapor-coating turbine buckets (1980-11-11),
11. 4230739 - Method of evaporating melts of alloys of metals having different vapor (1980-10-28),
12. 4226587 - Heating system for vacuum coating apparatus (1980-10-07),
13. 4218410 - Method for the production of high-purity metal powder by means of (1980-08-19),
14. 4208042 - Evaporating crucible (1980-06-17),
15. 4192253 - Vacuum coating apparatus (1980-03-11),

Title: Innovations of Hans Aichert

Introduction

Hans Aichert is a notable inventor based in Hanau am Main, Germany. He has made significant contributions to the field of sputtering technology, holding a total of 16 patents. His work has advanced the methods and apparatuses used for material application in various industries.

Latest Patents

Aichert's latest patents include a cathode sputtering apparatus based on the magnetron principle. This innovative device features a hollow cathode with a cylindrical sputtering surface and a cooling passage. The design incorporates a magnet system that creates a rotationally symmetrical tunnel of magnetic lines of force, enhancing the efficiency of the sputtering process. Another notable patent involves an apparatus for applying materials to a substrate within a vacuum chamber, utilizing a separate generator chamber to form a plasma guided by magnets.

Career Highlights

Throughout his career, Hans Aichert has worked with prominent companies such as Leybold-Heraeus GmbH and Leybold Aktiengesellschaft. His expertise in sputtering technology has positioned him as a key figure in the development of advanced manufacturing processes.

Collaborations

Aichert has collaborated with notable colleagues, including Herbert Stephan and Walter Dietrich. These partnerships have contributed to the innovation and refinement of his patented technologies.

Conclusion

Hans Aichert's contributions to sputtering technology and his extensive patent portfolio highlight his impact on the field of material application. His work continues to influence advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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