The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 1989

Filed:

May. 20, 1988
Applicant:
Inventors:

Gregor A Campbell, Glendale, CA (US);

Robert W Conn, Los Angeles, CA (US);

Dan M Goebel, Santa Monica, CA (US);

Rolf Adam, Hanau, DE;

Hans Aichert, Hanau, DE;

Hans Betz, Bruchkoebel, DE;

Anton Dietrich, Wiesenfeld, DE;

Gonde Dittmer, Burscheid, DE;

Klaus Hartig, Ronneburg, DE;

Friedrich Hass, Rodenbach, DE;

Rainer Ludwig, Karlstein-Bettingen, DE;

Max Mayr, Alzenau-Wasserlos, DE;

Alfred Thelen, Wehrheim, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419211 ; 20419212 ; 204298 ;
Abstract

An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.


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