The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 1980
Filed:
Nov. 15, 1978
Applicant:
Inventors:
Hans Aichert, Hanau am Main, DE;
Walter Dietrich, Hanau am Main, DE;
Friedrich Stark, Langenselbold, DE;
Herbert Stephan, Bruchkobel, DE;
Assignee:
Leybold-Heraeus GmbH, Cologne, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 42 ; 118 501 ; 2191 / ; 427250 ;
Abstract
Method and apparatus for vacuum depositing thin films on substrates which are located above 500.degree. C. by electron beam heating during the deposition. The substrates are positioned above an evaporating crucible filled with a bath of the material being evaporated which is also heated by electron beams. The electron beams are deflected at an angle of less than 80.degree. onto approximately one-half of the bath surface situated between the axis of symmetry and the end of the evaporating crucible.