Hanako Hata

Title: Hanako Hata: Innovator in CMP Technology

Introduction

Hanako Hata is a prominent inventor based in Iwaki, Japan. She has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 3 patents to her name, Hata has demonstrated her expertise and innovative spirit in developing advanced materials and methods.

Latest Patents

One of her latest patents is the CMP conditioner, which features diamond grit adhered to a conditioning surface. This design ensures that the 111 surfaces of the crystal grit are substantially parallel to the conditioning surface, optimizing contact with the polishing pad in CMP apparatuses. Another notable patent is for an electroplated grinding wheel and its production equipment and method. This invention aims to enhance cutting sharpness and longevity while reducing manufacturing costs. The mechanism involves a whetstone particle layer configured on the surface of the whetstone substrate, with multiple units linked by bridge units, showcasing her innovative approach to material design.

Career Highlights

Hata works at Mitsubishi Materials Corporation, where she has been instrumental in advancing CMP technologies. Her work has not only improved product performance but has also contributed to cost-effective manufacturing processes. Her dedication to innovation has positioned her as a key figure in her field.

Collaborations

Throughout her career, Hata has collaborated with notable colleagues, including Tsutomu Takahashi and Naoki Shimomae. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Hanako Hata's contributions to CMP technology exemplify her innovative spirit and commitment to excellence. Her patents reflect her ability to solve complex problems and improve existing technologies. Hata continues to inspire future generations of inventors and engineers in the field.