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For the Inventor, By the Inventor

San Jose, CA, United States of America

Han Wang

This inventor holds 41 USPTO granted patents and 11 published patent applications, primarily in Antenna Technology. Top assignees: Apple Inc., Applied Materials, Inc., Barefoot Networks, Inc.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Han Wang. Retrieved from https://idiyas.com/inventor/han-wang-wds70wx6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 41 

% Patents Active = 100.0

Average Co-Inventor Count = 7.4

ph-index = 4

Forward Citations = 69(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2020)
  • Cupertino, CA (US) (2019 - 2021)
  • Melbourne, FL (US) (2021)
  • Santa Clara, CA (US) (2021)
  • Palo Alto, CA (US) (2019 - 2022)
  • San Jose, CA (US) (2019 - 2023)
  • Campbell, CA (US) (2022 - 2024)

Company Filing History:

goldMedal22 out of 43,562 
 
Apple Inc.
 patents
silverMedal11 out of 14,454 
 
Applied Materials, Inc.
 patents
bronzeMedal2 out of 151 
 
Barefoot Networks, Inc.
 patents
4. 2 out of 9,904 
 
Meta Platforms, Inc.
 patents
5. 1 out of 36 
 
Florida Institute of Technology
 patents
6. 1 out of 1,247 
 
National Yang Ming Chiao Tung University
 patents
7. 1 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
8. 2 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2019-2026

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Areas of Expertise:
Antenna Design
Ultra-Wideband Antenna
Semiconductor Devices
Surface Texturing
Multi-Feed Antenna
Chamber Component
Signal Feed Terminals
Optical Communications
Near-Field Communications
Conductive Contact
Device Patterning
High Aspect Ratio
41 patents (USPTO):Explore Patents
1. 12713846 - SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS (2026-08-18),
2. 12707911 - Introduction of metal in hard mask for high aspect ratio device patterning (2026-08-11),
3. 12707794 - Semiconductor devices and methods of manufacture (2026-08-11),
4. 12689126 - Electronic device having antenna with vent structures (2026-07-21),
5. 12671181 - Ultra-wideband antenna matching (2026-06-30),
6. 12658592 - Electronic device with antenna grounding springs and pads (2026-06-16),
7. 12658589 - Electronic device having antenna tuning components across a knuckle (2026-06-16),
8. 12658580 - Electronic device with antenna grounding through sensor module (2026-06-16),
9. 12635435 - Ruthenium carbide for DRAM capacitor mold patterning (2026-05-19),
10. 12579330 - Communication link analysis for false-alarm detection and security enhancement using enhanced codes (2026-03-17),
11. 12567673 - Electronic device having stacked-patch antenna with floating ground via (2026-03-03),
12. 12550651 - Selective etching of silicon-containing material relative to metal-doped boron films (2026-02-10),
13. 12519234 - Ultra-wideband antenna assembly (2026-01-06),
14. 12519231 - Electronic device having antenna tuners around connector (2026-01-06),
15. 12439514 - Electronic device having conductive contact soldered to printed circuit (2025-10-07),

Title: The Innovative Journey of Han Wang

Introduction: Han Wang, a visionary inventor based in San Jose, CA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Han Wang's latest patents include a cutting-edge artificial intelligence algorithm for autonomous vehicles and a revolutionary wearable device for monitoring health metrics in real-time.

Career Highlights: With a background in computer science and engineering, Han Wang has a successful track record of developing disruptive technologies that have reshaped industries. He has held key positions in leading tech companies, driving innovation and pushing the boundaries of what is possible.

Collaborations: Throughout his career, Han Wang has collaborated with top researchers, engineers, and designers to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Han Wang's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors. His impact on the tech industry is undeniable, and his legacy will undoubtedly shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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