Cromwell, CT, United States of America

Han Wang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):

Title: The Innovative Contributions of Han Wang

Introduction

Han Wang is a notable inventor based in Cromwell, Connecticut, who has made significant contributions to the field of materials science. With a total of four patents to his name, he has focused on developing advanced methods for depositing metal films and improving the nucleation of conductive nitride films. His work is instrumental in enhancing the performance of microelectronic devices.

Latest Patents

One of Han Wang's latest patents is titled "Methods for depositing tungsten or molybdenum films." This patent describes vapor deposition methods for applying metal films or layers onto a substrate, utilizing organometallic precursor compounds that contain tungsten or molybdenum. The process involves depositing a metal layer formed from the precursor metal onto a substrate, followed by the introduction of an oxidizer to the formed metal layer.

Another significant patent is the "Method for nucleation of conductive nitride films." This patent presents an improved methodology for the nucleation of certain metal nitride substrate surfaces. It utilizes silicon-containing halides, silicon-containing amides, and specific metal precursors in conjunction with nitrogen-containing reducing gases. The methodology demonstrates greatly improved nucleation, allowing for the rapid deposition of traditional layer-upon-layer structures on microelectronic device substrates.

Career Highlights

Han Wang is currently employed at Entegris, Inc., where he continues to innovate and develop new technologies. His work has been pivotal in advancing the capabilities of materials used in microelectronics, contributing to the efficiency and effectiveness of various applications.

Collaborations

Han has collaborated with notable colleagues, including Thomas H. Baum and Bryan Clark Hendrix. These collaborations have fostered a productive environment for innovation and have led to the successful development of new technologies in the field.

Conclusion

In summary, Han Wang is a distinguished inventor whose work in vapor deposition methods and nucleation techniques has significantly impacted the microelectronics industry. His contributions continue to pave the way for advancements in technology and materials science.

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