Han Teo Park

Title: The Innovative Mind of Han Teo Park

Introduction

Han Teo Park, an innovative inventor based in Anseong-si, South Korea, has made significant strides in the field of polishing technology. With a total of two patents to his name, he has developed inventive solutions that are crucial in semiconductor manufacturing processes.

Latest Patents

Han Teo Park's most recent patents include a cutting-edge polishing slurry composition and a specialized slurry composition for polishing tungsten. The polishing slurry composition features at least two types of abrasive particles, alongside an oxidizer, which effectively reduces peak-to-valley roughness on tungsten-containing films by increasing the contact area between abrasive particles. Additionally, his slurry composition for polishing tungsten incorporates a water-soluble polymer, abrasive particles, and an etching adjuster, further enhancing the polishing process.

Career Highlights

Currently, Han Teo Park is affiliated with K. C. Tech Co., Ltd., where he employs his expertise in polishing technology to advance industrial applications. His work reflects a deep commitment to innovation, contributing to the optimization of semiconductor polishing processes essential for electronic device manufacturing.

Collaborations

Throughout his career, Han has collaborated with talented individuals such as Hyun Goo Kong and Jin Sook Hwang. These partnerships have fostered a dynamic environment for research and development, allowing for the exchange of ideas and collective problem-solving.

Conclusion

Han Teo Park stands out as a significant figure in the realm of polishing technologies. His innovative patents and collaborative efforts demonstrate his dedication to excellence and advancement in the semiconductor industry. As he continues to drive innovation at K. C. Tech Co., Ltd., the future of polishing technology looks promising.