The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2018
Filed:
Jul. 08, 2016
Applicant:
K.c. Tech Co., Ltd., Anseong-si, KR;
Inventors:
Dong Kyu Choi, Anseong-si, KR;
Young Ho Yoon, Anseong-si, KR;
Hyun Goo Kong, Anseong-si, KR;
Jin Sook Hwang, Anseong-si, KR;
Han Teo Park, Anseong-si, KR;
Assignee:
KCTech Co., Ltd., Anseong-si, KR;
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); C09G 1/02 (2006.01); C23F 3/06 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C23F 3/06 (2013.01);
Abstract
A polishing slurry composition is provided. The polishing slurry composition includes at least two types of abrasive particles among first abrasive particles, second abrasive particles, and third abrasive particles, and an oxidizer. A peak-to-valley roughness Rpv decreases when a contact area between the abrasive particles and a tungsten-containing film increases.