Kaohsiung, Taiwan

Han-Lung Chang

This inventor holds 55 USPTO granted patents and 16 published patent applications, primarily in Extreme Ultraviolet Lithography. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2018-2026.

USPTO Granted Patents = 55 

% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 48(Granted Patents)

Forward Citations (Not Self Cited) = 18(Dec 10, 2025)


Location History:

  • Kaohsiung, TW (2018 - 2024)
  • Hsinchu, TW (2019 - 2024)

Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
EUV Lithography
Photolithography
Droplet Generator
Laser Devices
Reticle Carrier
Mask Inspection Tool
Energy Decay Mitigation
EUV Light Source
Shock Wave Visualization
Alignment Systems
Ablation Control
Radiation Source
55 patents (USPTO):Explore Patents

Title: Innovations of Han-Lung Chang: A Leader in Semiconductor Technology

Introduction

Han-Lung Chang, based in Kaohsiung, Taiwan, is a prominent inventor known for his significant contributions to semiconductor technology. With an impressive portfolio of 50 patents, he has made groundbreaking advancements that have been crucial in enhancing the manufacturing processes of semiconductor devices.

Latest Patents

Among his latest innovations, two patents stand out. The first, titled "Apparatus and method for generating extreme ultraviolet radiation," describes a target droplet source designed for extreme ultraviolet (EUV) lithography. This invention includes a droplet generator that efficiently produces target droplets of a specified material in a controlled environment. The setup includes a nozzle within a chamber and a sleeve that channels the droplets, optimizing the EUV generation process.

The second patent, "Reticle carrier and associated methods," addresses the challenges associated with residual charge on reticles. This innovation enables quick discharging of residual charges, reducing the potential for particle attraction during the semiconductor manufacturing process. By minimizing the capacitance between the reticle carrier baseplate and the reticle, this invention enhances manufacturing quality and yield while reducing defects and rework.

Career Highlights

Currently, Han-Lung Chang serves at Taiwan Semiconductor Manufacturing Company (TSMC), a leader in the semiconductor industry. His innovative mindset and technical expertise contribute to TSMC’s reputation for cutting-edge technology and high-quality semiconductor products.

Collaborations

Throughout his career, Han-Lung Chang has collaborated with several notable engineers, including Li-Jui Chen and Po-Chung Cheng. These collaborations have been vital in pushing the boundaries of what is possible in semiconductor technology and driving advancements that benefit the entire industry.

Conclusion

Han-Lung Chang's contributions to semiconductor innovations are not only impressive in their scope but also impactful in their application. With his extensive patent portfolio and ongoing work at TSMC, he continues to shape the future of semiconductor manufacturing, ensuring better quality and efficiency in the production of electronic devices. His inventions exemplify the spirit of innovation that propels the industry forward.

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