Han-Hui Hsu

Title: Han-Hui Hsu: Innovator in Patterning Methods and Isolation Structures

Introduction

Han-Hui Hsu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of material science and engineering, particularly in the development of innovative patterning methods and isolation structures. With a total of 5 patents to his name, Hsu continues to push the boundaries of technology.

Latest Patents

Hsu's latest patents include a novel patterning method that provides a systematic approach to creating intricate designs on substrates. This method involves the formation of a mask layer on an objective material layer, followed by the creation of a patterned layer that includes a metal-containing substance. The mask layer is then patterned to facilitate the precise structuring of the objective material layer. Another significant patent focuses on an isolation structure that features a substrate with a trench. This trench has a first inclined surface and a second inclined surface, each with different slopes, enhancing the functionality of the structure.

Career Highlights

Hsu is currently employed at Macronix International Co., Ltd., where he applies his expertise in material science to develop cutting-edge technologies. His work has been instrumental in advancing the company's capabilities in semiconductor manufacturing and design.

Collaborations

Throughout his career, Hsu has collaborated with notable colleagues, including Shih-Ping Hong and Ming-Tsung Wu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Han-Hui Hsu is a distinguished inventor whose work in patterning methods and isolation structures has made a significant impact in the field of material science. His contributions continue to inspire advancements in technology and innovation.