The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jul. 07, 2008
Applicants:
Han-hui Hsu, Hsinchu, TW;
Shih-ping Hong, Hsinchu, TW;
An-chi Wei, Hsinchu, TW;
Ming-tsung Wu, Hsinchu, TW;
Inventors:
Han-Hui Hsu, Hsinchu, TW;
Shih-Ping Hong, Hsinchu, TW;
An-Chi Wei, Hsinchu, TW;
Ming-Tsung Wu, Hsinchu, TW;
Assignee:
MACRONIX International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/3105 (2006.01); H01L 21/314 (2006.01);
U.S. Cl.
CPC ...
Abstract
A patterning method is provided. First, a substrate having an objective material layer thereon is provided. Thereafter, a mask layer is formed on the objective material layer. Afterwards, a patterned layer is formed over the mask layer, wherein a material of the patterned layer includes a metal-containing substance. Then, the mask layer is patterned to form a patterned mask layer. Further, the objective material layer is patterned, using the patterned mask layer as a mask.