Ham-Ming Hsieh

Title: The Innovative Contributions of Ham-Ming Hsieh

Introduction

Ham-Ming Hsieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing. His work focuses on improving the efficiency and accuracy of wafer processing.

Latest Patents

Ham-Ming Hsieh holds a patent for a method to predict and identify defocus wafers. This innovative method and system involve mapping the topography of each wafer in a first wafer batch using a level sensor apparatus. The process includes calculating a focus spot deviation from the data, which corresponds to the height by which a focus spot of a photo exposure module would be defocused by the topography. The focus spot deviation is then converted to a corresponding wafer stage set point, allowing the photo exposure module to focus the spot on each wafer in the batch. This method effectively identifies a defocus wafer, which is defined as a wafer having a topography that would defocus the focus spot, even when the photo exposure module is set to the wafer stage set point. Ham-Ming Hsieh has 1 patent to his name.

Career Highlights

Ham-Ming Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to contribute to advancements in wafer processing technology.

Collaborations

Throughout his career, Ham-Ming Hsieh has collaborated with esteemed colleagues, including Li-Kong Turn and Chi-Hung Liao. These collaborations have further enhanced his innovative capabilities and contributions to the field.

Conclusion

Ham-Ming Hsieh's work exemplifies the spirit of innovation in semiconductor manufacturing. His patented method for identifying defocus wafers showcases his commitment to improving technology in this critical industry.