The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Feb. 25, 2004
Chun-hung Lin, Taoyuan, TW;
Louie Liu, Hsin-Chu, TW;
Li-kong Turn, Taichung, TW;
Chi-hung Liao, Sanchong, TW;
Ham-ming Hsieh, Hsin-Chu, TW;
Yi-chang Sung, Jhubei, TW;
Hsin-chun Chiang, Shanhua Township, Tainan County, TW;
Chun-Hung Lin, Taoyuan, TW;
Louie Liu, Hsin-Chu, TW;
Li-Kong Turn, Taichung, TW;
Chi-Hung Liao, Sanchong, TW;
Ham-Ming Hsieh, Hsin-Chu, TW;
Yi-Chang Sung, Jhubei, TW;
Hsin-Chun Chiang, Shanhua Township, Tainan County, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method and system for identifying a defocus wafer by mapping a topography of each wafer in a first wafer batch using a level sensor apparatus (); calculating a focus spot deviation () from the data, the focus spot deviation () corresponding to a height by which a focus spot of a photo exposure module would be defocused by the topography; converting the focus spot deviation () to a corresponding wafer stage set point to which the photo exposure module is set, to focus the focus spot on each wafer in the wafer batch; and identifying a defocus wafer in the wafer batch, as a wafer having a topography that would defocus the focus spot, even when the photo exposure module is set to the wafer stage set point.