Taiwan Semiconductor Manufacturing Comp. Ltd.

Ham-Ming Hsieh

Chi-Hung Liao

Chun-Hung Lin

Li-Kong Turn

Yi-Chang Sung

Hsin-Chun Chiang

Louie Liu

A method and system for identifying a defocus wafer by mapping a topography of each wafer in a first wafer batch using a level sensor apparatus (); calculating a focus spot deviation () from the data, the focus spot deviation () corresponding to a height by which a focus spot of a photo exposure module would be defocused by the topography; converting the focus spot deviation () to a corresponding wafer stage set point to which the photo exposure module is set, to focus the focus spot on each wafer in the wafer batch; and identifying a defocus wafer in the wafer batch, as a wafer having a topography that would defocus the focus spot, even when the photo exposure module is set to the wafer stage set point.

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Hsin-Chu, Taiwan

Ham-Ming Hsieh