Seoul, South Korea

HakJoon Lee

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Asm IP Holding B.v.. Active years: 2022-2026.

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2026

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4 patents (USPTO):Explore Patents

Title: HakJoon Lee: Innovator in Substrate Processing Methods

Introduction

HakJoon Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His innovative approaches have the potential to enhance various applications in semiconductor manufacturing.

Latest Patents

HakJoon Lee's latest patents focus on advanced substrate processing methods. One of his notable inventions is a substrate processing method capable of forming a film with improved step coverage on a surface of a gap structure with a high aspect ratio. This method involves providing a gap structure with a first and second step portion, supplying gas that includes a source gas, generating active species from the source gas, and exciting neutral molecules toward the lower surface of a recess.

Another significant patent is a substrate processing method for gap-filling a recess between a first protrusion and a second protrusion of a pattern structure. This method includes changing the profile of a layer formed on the pattern structure to suppress void formation in the upper area while allowing for controlled void positioning in the lower area.

Career Highlights

HakJoon Lee is currently associated with ASM IP Holding B.V., where he continues to develop innovative solutions in substrate processing. His work has been instrumental in advancing technologies that are critical to the semiconductor industry.

Collaborations

Some of his coworkers include KyungEun Lee and HakJoo Lee, who collaborate with him on various projects within the company.

Conclusion

HakJoon Lee's contributions to substrate processing methods demonstrate his commitment to innovation in the semiconductor field. His patents reflect a deep understanding of the complexities involved in film formation and gap-filling techniques.

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