The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Oct. 10, 2022
Asm Ip Holding B.v., Almere, NL;
Doohyun La, Suwon-si, KR;
Kyungeun Lee, Suwon-si, KR;
Hakjoon Lee, Seoul, KR;
Yoonki Min, Hwaseong-si, KR;
Harim Kim, Hwaseong-si, KR;
Donghyun Ko, Hwaseong-si, KR;
Seongil Cho, Cheonan-si, KR;
ASM IP Holding B.V., Almere, NL;
Abstract
A substrate processing method capable of forming a film with an improved step coverage on a surface of a gap structure having a high aspect ratio includes: providing a gap structure having a first step and a second step portion; supplying gas including a source gas onto the gap structure; generating active species from the source gas; generating neutral molecules by neutralizing the active species, and moving the neutral molecules in a direction toward a lower surface of a recess extending between the first stepped portion and the second stepped portion; and exciting the neutral molecules moving in the direction toward the lower surface.