Beacon, NY, United States of America

Hakeem B S Akinmade-Yusuff


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 14(Granted Patents)


Location History:

  • Hopewell Junction, NY (US) (2012)
  • Beacon, NY (US) (2011 - 2014)

Company Filing History:


Years Active: 2011-2014

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6 patents (USPTO):

Title: Hakeem B S Akinmade-Yusuff: Innovator in Lithographic Technology

Introduction

Hakeem B S Akinmade-Yusuff is a notable inventor based in Beacon, NY (US). He has made significant contributions to the field of lithographic technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and effectiveness of lithographic processes, which are crucial in various manufacturing applications.

Latest Patents

Among his latest patents is the "Bilayer trench first hardmask structure and process for reduced defectivity." This invention outlines a method and structure for transferring a lithographic pattern into a substrate. It involves forming a dielectric hardmask layer over a dielectric substrate, followed by a metal hardmask layer and a protective capping hardmask layer. A lithographic structure for pattern transfer is then created over the capping layer, allowing for precise pattern transfer into the dielectric substrate. The capping hardmask layer can be removed during subsequent processing, enhancing the overall efficiency of the method.

Another significant patent is the "Edge protection seal for bonded substrates." This invention describes a process where a dielectric material layer is deposited on exposed surfaces of a bonded structure, which includes a first substrate and a second substrate. The dielectric material layer is formed on the exposed planar surface of the second substrate and the entirety of the peripheral sidewalls of both substrates. This layer can be created through various deposition methods, such as chemical vapor deposition, atomic layer deposition, or plasma-induced deposition. The dielectric material layer effectively seals the entire periphery of the interface between the two substrates, ensuring structural integrity.

Career Highlights

Hakeem B S Akinmade-Yusuff is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies. His work at IBM has positioned him as a key player in advancing lithographic techniques, contributing to the company's reputation for technological excellence.

Collaborations

Throughout his career, Hakeem has collaborated with several talented individuals, including Richard Stephan Wise and Mukta G Farooq. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hakeem B S Akinmade-Yusuff is a distinguished inventor whose contributions to lithographic technology have made a significant impact in the field. His innovative patents and work at IBM highlight his

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