Company Filing History:
Years Active: 2022-2025
Title: Hajime Nishide: Innovator in Substrate Processing Technology
Introduction
Hajime Nishide is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of various processing apparatuses.
Latest Patents
Nishide's latest patents include a substrate processing apparatus designed to enhance the collection and management of exhaust gases. This apparatus features multiple processing parts arranged vertically, with corresponding collecting pipes for different fluid classifications. Additionally, he has developed a chemical liquid preparation device that optimizes the preparation of TMAH-containing chemical liquids. This method involves a series of steps to establish a relationship between gas supply ratios and dissolved oxygen concentrations, ensuring precise chemical preparation.
Career Highlights
Nishide is currently employed at Screen Holdings Co., Ltd., where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the capabilities of processing equipment used in various industries.
Collaborations
Throughout his career, Nishide has collaborated with notable colleagues, including Takashi Izuta and Takatoshi Hayashi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Hajime Nishide's contributions to substrate processing technology reflect his dedication to innovation and excellence. His patents and ongoing work at Screen Holdings Co., Ltd. continue to influence the industry positively.